Fully automatic vertical stand tube furnace-TRUE P Technology

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Tel: 0551-63484895

After Sales: 4006082908

Headquarters address: No. 4708 Yungu Road, Economic and Technological Development Zone, Hefei City, Anhui Province, China

Produce address: Zhenping Technology Industrial Park, No. 4345 Tiandu Road, Hefei Economic and Technological Development Zone, Anhui Province, China

Fully automatic vertical stand tube furnace

Category：

Semiconductor process equipment

Keywords: Semiconductor specific equipment

Hotline：

0551-63484895

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Description

(1) Product usage:

Integrated circuit wafer glue, BPO glue/PI glue/BCB glue curing, IC (wafer, CMOS, Bumping, TSV, MEMS, fingerprint recognition, IGBT); integrated circuit wafer rapid annealing furnace/alloy furnace

(2) Product features:

2.1. Integrated human-machine operating system, continuous automated production, high work efficiency, saving labor costs, electricity and process time.

2.2.FEC heating, rapid temperature rise and good uniformity

2.3. Comes with self-cleaning function - high temperature cleaning

(3)Technical parameters

Handling products	8/12inch wafer	Throughput	100pcs/tube, 75PCS/tube
heater	Round FEC heating plate
Feeding port	2/3/4	Manipulator	1/2
temperature range	Long-term use temperature: 350℃, maximum temperature: 750℃
Heating rate	＜8℃/min	cooling rate	＜7℃/min
heating power	30kW (single furnace)	Heating temperature zone	3pcs/tube
Furnace temperature uniformity	±2℃ (350℃ constant temperature)	Temperature control thermocouple	K graduation
Temperature control method	SSR	Program control	PID control
Furnace material	quartz	Insulation Materials	Ceramic fiber
atmosphere control	Multi-channel flow meter adjusts the air intake: flow measurement range: 1) 0-150L/min nitrogen 2) 0-40L/min oxygen		atmosphere	N2/O2
Exhaust system	Set up an exhaust chimney at the top for waste gas emission and recovery